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    Effect of multi-functional amines on SiGe surface finish during chemical mechanical polishing

    New search for: Yang, Shenghua
    New search for: Zhang, Baoguo
    New search for: Wang, Chenwei
    New search for: He, Yangang
    New search for: Wang, Jianchao
    New search for: Wang, Ru
    New search for: Liu, Yuling

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    Effect of multi-functional amines on SiGe surface finish during chemical mechanical polishing

    New search for: Yang, Shenghua
    New search for: Zhang, Baoguo
    New search for: Wang, Chenwei
    New search for: He, Yangang
    New search for: Wang, Jianchao
    New search for: Wang, Ru
    New search for: Liu, Yuling

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of multi-functional amines on SiGe surface finish during chemical mechanical polishing

    New search for: Yang, Shenghua
    New search for: Zhang, Baoguo
    New search for: Wang, Chenwei
    New search for: He, Yangang
    New search for: Wang, Jianchao
    New search for: Wang, Ru
    New search for: Liu, Yuling

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Effect of multi-functional amines on SiGe surface finish during chemical mechanical polishing

    Contributors:

    Yang, Shenghua (author) / Zhang, Baoguo (author) / Wang, Chenwei (author) / He, Yangang (author) / Wang, Jianchao (author) / Wang, Ru (author) / Liu, Yuling (author)

    Published in:

    Materials science in semiconductor processing ; 99 ; 114-124

    Publication date:

    2019-01-01

    Size:

    11 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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