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Surface smoothing of SiGe strain-relaxed buffer layers by chemical mechanical polishing
Surface smoothing of SiGe strain-relaxed buffer layers by chemical mechanical polishing
Surface smoothing of SiGe strain-relaxed buffer layers by chemical mechanical polishing
Sawano, K. (author) / Kawaguchi, K. (author) / Ueno, T. (author) / Koh, S. (author) / Nakagawa, K. (author) / Shiraki, Y. (author)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 89 ; 406 - 409
2002-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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