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Deuterium concentration depth profiling in sputter-deposited tungsten coated F82H using secondary ion mass spectrometry
Deuterium plasma-driven permeation (PDP) through reduced activation ferritic steel alloy F82H with and without sputter-deposited tungsten (SP-W) coatings has been conducted using a laboratory-scale steady-state plasma facility. SP-W coatings have been found to enhance PDP flux with a much slow breakthrough to reach steady-state. Static deuterium retention has been evaluated with thermal desorption spectroscopy. Enhanced deuterium retention in SP-W coated F82H has been observed, compared with that in bare F82H. Secondary ion mass spectrometry (SIMS) has been carried out to obtain the depth profile of deuterium concentration crossing the W/F82H interface. SIMS data indicate the deuterium concentration is much higher in W coatings than that in F82H substrate, exhibiting an “uphill diffusion” profile. Keywords: Plasma-driven permeation, SIMS, Tungsten coatings, F82H, Deuterium retention
Deuterium concentration depth profiling in sputter-deposited tungsten coated F82H using secondary ion mass spectrometry
Deuterium plasma-driven permeation (PDP) through reduced activation ferritic steel alloy F82H with and without sputter-deposited tungsten (SP-W) coatings has been conducted using a laboratory-scale steady-state plasma facility. SP-W coatings have been found to enhance PDP flux with a much slow breakthrough to reach steady-state. Static deuterium retention has been evaluated with thermal desorption spectroscopy. Enhanced deuterium retention in SP-W coated F82H has been observed, compared with that in bare F82H. Secondary ion mass spectrometry (SIMS) has been carried out to obtain the depth profile of deuterium concentration crossing the W/F82H interface. SIMS data indicate the deuterium concentration is much higher in W coatings than that in F82H substrate, exhibiting an “uphill diffusion” profile. Keywords: Plasma-driven permeation, SIMS, Tungsten coatings, F82H, Deuterium retention
Deuterium concentration depth profiling in sputter-deposited tungsten coated F82H using secondary ion mass spectrometry
Y. Xu (author) / Y. Hirooka (author) / L.M. Luo (author) / Y.C. Wu (author)
2019
Article (Journal)
Electronic Resource
Unknown
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