A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
Niobium oxide sputtering target, production method therefor, and niobium oxide film
The present invention provides a niobium oxide sputtering target that enables direct current (DC) sputtering, and also provides a production method and an niobium oxide film. This niobium oxide sputtering target is characterized by being a niobium oxide sintered body and in that the specific resistance thereof is 0.001-0.05 [Omega]cm over the entire area of the sintered body in the thickness direction.
Niobium oxide sputtering target, production method therefor, and niobium oxide film
The present invention provides a niobium oxide sputtering target that enables direct current (DC) sputtering, and also provides a production method and an niobium oxide film. This niobium oxide sputtering target is characterized by being a niobium oxide sintered body and in that the specific resistance thereof is 0.001-0.05 [Omega]cm over the entire area of the sintered body in the thickness direction.
Niobium oxide sputtering target, production method therefor, and niobium oxide film
UMEMOTO KEITA (author) / ZHANG SHOUBIN (author)
2015-11-18
Patent
Electronic Resource
English
NIOBIUM OXIDE SPUTTERING TARGET, PRODUCTION METHOD THEREFOR, AND NIOBIUM OXIDE FILM
| European Patent Office | 2015
Niobium oxide plane target preparation method and niobium oxide plane target
| European Patent Office | 2015
Niobium oxide rotating target and preparing method of niobium oxide rotating target
| European Patent Office | 2015
European Patent Office | 2018
| European Patent Office | 2017