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Sintering device and preparation method of oxide ceramic target material
The invention belongs to the technical field of target material preparation and provides a sintering device and a preparation method of an oxide ceramic target material. The sintering device providedby the invention comprises a sintering furnace body and a shunting spacer arranged in the furnace chamber of the sintering furnace body. In a sintering process, oxygen is introduced into the furnace chamber through the shunting spacer, so that the temperature difference of the furnace chamber can be reduced; the layered distribution of oxygen flow is controlled, oxygen vacancy density and the precipitation and distribution uniformity of a second phase in a target material sintering process are accurately controlled, and therefore, the quality of a target material can be effectively improved, sintering time is shortened, and the deformation, contractibility and the shape of the second phase of the sintered target material are regulated and controlled. When the sintering device is used for preparing the oxide ceramic target material, the relative density of the obtained target material is larger than 99.9%, and nodulation is not likely to happen in the using process of the sintering device.
本发明涉及靶材制备技术领域，提供了一种烧结装置及一种氧化物陶瓷靶材的制备方法。本发明提供的烧结装置包括烧结炉炉体和设置在烧结炉炉腔内的分流隔片，在烧结过程中通过分流隔片向炉腔内输送氧气，能够减小炉腔温差，控制氧气流的层状分布，精准控制靶材烧结过程中氧空位密度及第二相的析出与分布均匀性，可有效提升靶材的质量，减少烧结时长，调控烧结靶材变形量、收缩性以及第二相的形状；使用本发明的烧结装置制备氧化物陶瓷靶材，所得靶材的相对密度大于99.9％，且使用过程中不易结瘤。
Sintering device and preparation method of oxide ceramic target material
The invention belongs to the technical field of target material preparation and provides a sintering device and a preparation method of an oxide ceramic target material. The sintering device providedby the invention comprises a sintering furnace body and a shunting spacer arranged in the furnace chamber of the sintering furnace body. In a sintering process, oxygen is introduced into the furnace chamber through the shunting spacer, so that the temperature difference of the furnace chamber can be reduced; the layered distribution of oxygen flow is controlled, oxygen vacancy density and the precipitation and distribution uniformity of a second phase in a target material sintering process are accurately controlled, and therefore, the quality of a target material can be effectively improved, sintering time is shortened, and the deformation, contractibility and the shape of the second phase of the sintered target material are regulated and controlled. When the sintering device is used for preparing the oxide ceramic target material, the relative density of the obtained target material is larger than 99.9%, and nodulation is not likely to happen in the using process of the sintering device.
本发明涉及靶材制备技术领域，提供了一种烧结装置及一种氧化物陶瓷靶材的制备方法。本发明提供的烧结装置包括烧结炉炉体和设置在烧结炉炉腔内的分流隔片，在烧结过程中通过分流隔片向炉腔内输送氧气，能够减小炉腔温差，控制氧气流的层状分布，精准控制靶材烧结过程中氧空位密度及第二相的析出与分布均匀性，可有效提升靶材的质量，减少烧结时长，调控烧结靶材变形量、收缩性以及第二相的形状；使用本发明的烧结装置制备氧化物陶瓷靶材，所得靶材的相对密度大于99.9％，且使用过程中不易结瘤。
Sintering device and preparation method of oxide ceramic target material
一种烧结装置及一种氧化物陶瓷靶材的制备方法
LI XIFENG (author) / YU ZHENGHANG (author) / ZHANG JIANHUA (author) / CHEN LONGLONG (author) / JIANG SHU (author)
2020-04-10
Patent
Electronic Resource
Chinese
IPC:
F27B
Industrieöfen, Schachtöfen, Brennöfen, Retorten allgemein
,
FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL
/
B28B
Formgeben von Ton oder anderen keramischen Stoffzusammensetzungen, Schlacke oder von Mischungen, die zementartiges Material enthalten, z.B. Putzmörtel
,
SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG OR MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
/
C04B
Kalk
,
LIME
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