A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
PERHYDROPOLYSILAZANE COMPOSITIONS AND METHODS FOR FORMING OXIDE FILMS USING SAME
A Si-containing film forming composition comprising a catalyst and/or a polysilane and a N-H free, C-free, and Si-rich perhydropolysilazane having a molecular weight ranging from approximately 332 dalton to approximately 100,000 dalton and comprising N-H free repeating units having the formula [-N(SiH3)x(SiH2-)y], wherein x=0, 1, or 2 and y= 0, 1, or 2 with x+y=2; and x= 0, 1 or 2 and y=1, 2, or 3with x+y=3. Also disclosed are synthesis methods and applications for using the same.
一种含Si膜形成组合物，包含催化剂和/或聚硅烷以及不含N‑H、不含C且富含Si的全氢聚硅氮烷，该全氢聚硅氮烷具有在从大约332道尔顿至大约100,000道尔顿范围内的分子量并且包含具有式[‑N(SiH3)x(SiH2‑)y]的不含N‑H的重复单元，其中x＝0、1或2并且y＝0、1或2，并且x+y＝2；并且x＝0、1或2，并且y＝1、2或3，并且x+y＝3。还披露了合成方法和使用其的应用。
PERHYDROPOLYSILAZANE COMPOSITIONS AND METHODS FOR FORMING OXIDE FILMS USING SAME
A Si-containing film forming composition comprising a catalyst and/or a polysilane and a N-H free, C-free, and Si-rich perhydropolysilazane having a molecular weight ranging from approximately 332 dalton to approximately 100,000 dalton and comprising N-H free repeating units having the formula [-N(SiH3)x(SiH2-)y], wherein x=0, 1, or 2 and y= 0, 1, or 2 with x+y=2; and x= 0, 1 or 2 and y=1, 2, or 3with x+y=3. Also disclosed are synthesis methods and applications for using the same.
一种含Si膜形成组合物，包含催化剂和/或聚硅烷以及不含N‑H、不含C且富含Si的全氢聚硅氮烷，该全氢聚硅氮烷具有在从大约332道尔顿至大约100,000道尔顿范围内的分子量并且包含具有式[‑N(SiH3)x(SiH2‑)y]的不含N‑H的重复单元，其中x＝0、1或2并且y＝0、1或2，并且x+y＝2；并且x＝0、1或2，并且y＝1、2或3，并且x+y＝3。还披露了合成方法和使用其的应用。
PERHYDROPOLYSILAZANE COMPOSITIONS AND METHODS FOR FORMING OXIDE FILMS USING SAME
全氢聚硅氮烷组合物和用于使用其形成氧化物膜的方法
SANCHEZ ANTONIO (author) / ITOV GENNADIY (author) / KHANDELWAL MANISH (author) / RITTER COLE (author) / ZHANG PENG (author) / GIRARD JEAN-MARC (author) / WAN ZHIWEN (author) / KUCHENBEISER GLENN (author) / ORBAN DAVID (author) / KERRIGAN SEAN (author)
2020-11-06
Patent
Electronic Resource
Chinese
IPC:
C01B
NON-METALLIC ELEMENTS
,
Nichtmetallische Elemente
/
C04B
Kalk
,
LIME
/
C07F
Acyclische, carbocyclische oder heterocyclische Verbindungen, die andere Elemente als Kohlenstoff, Wasserstoff, Halogen, Sauerstoff, Stickstoff, Schwefel, Selen oder Tellur enthalten
,
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
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