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Waste ITO target recycling method
The invention provides a waste ITO target recycling method which comprises the steps of putting an ITO waste target into a vaporization furnace, raising the temperature in the furnace to 4000-5000 DEG C in a gradient manner, raising the temperature to 500 DEG C in 0-30 minutes, putting the ITO waste target into the vaporization furnace at the temperature, preserving the heat, raising the temperature to 3000 DEG C in 30-40 minutes, raising the temperature to 4000-5000 DEG C in 40-60 minutes, preserving the heat until the ITO waste target is completely vaporized, finally cooling in a nitrogen atmosphere to obtain ITO powder with the purity of 4N and the specific area of 6-8, and performing ball milling, isostatic cool pressing, sintering, machining and binding to finally obtain the ITO target material. Gradient heating is adopted, the waste target is put when the temperature is increased to 500 DEG C, and the temperature is increased to 4000-5000 DEG C, so that the waste target can be completely vaporized, the waste target can be well controlled to be completely vaporized, the prepared ITO powder is high in purity, and the waste target utilization effect is good.
本发明提供一种ITO靶材废靶循环利用方法，通过将ITO废靶放入汽化炉内，将炉内温度呈梯度升高至4000‑5000℃，0‑30min升温至500℃，在此温度下放入ITO废靶，之后保温，30‑40min升温至3000℃，40‑60min升温至4000‑5000℃，之后保温，直至ITO废靶全部汽化，最后在氮气气氛下冷却，得到纯度4N，比表面6‑8的ITO粉末，再进行球磨、冷等静压、烧结、机加工、绑定，最终得到ITO靶材，这样采用梯度升温，在升温至500℃时放入废靶，再升温至4000‑5000℃，可以对废靶完全汽化，很好的控制废靶全部汽化，制得的ITO粉纯度高，废靶利用效果好。
Waste ITO target recycling method
The invention provides a waste ITO target recycling method which comprises the steps of putting an ITO waste target into a vaporization furnace, raising the temperature in the furnace to 4000-5000 DEG C in a gradient manner, raising the temperature to 500 DEG C in 0-30 minutes, putting the ITO waste target into the vaporization furnace at the temperature, preserving the heat, raising the temperature to 3000 DEG C in 30-40 minutes, raising the temperature to 4000-5000 DEG C in 40-60 minutes, preserving the heat until the ITO waste target is completely vaporized, finally cooling in a nitrogen atmosphere to obtain ITO powder with the purity of 4N and the specific area of 6-8, and performing ball milling, isostatic cool pressing, sintering, machining and binding to finally obtain the ITO target material. Gradient heating is adopted, the waste target is put when the temperature is increased to 500 DEG C, and the temperature is increased to 4000-5000 DEG C, so that the waste target can be completely vaporized, the waste target can be well controlled to be completely vaporized, the prepared ITO powder is high in purity, and the waste target utilization effect is good.
本发明提供一种ITO靶材废靶循环利用方法，通过将ITO废靶放入汽化炉内，将炉内温度呈梯度升高至4000‑5000℃，0‑30min升温至500℃，在此温度下放入ITO废靶，之后保温，30‑40min升温至3000℃，40‑60min升温至4000‑5000℃，之后保温，直至ITO废靶全部汽化，最后在氮气气氛下冷却，得到纯度4N，比表面6‑8的ITO粉末，再进行球磨、冷等静压、烧结、机加工、绑定，最终得到ITO靶材，这样采用梯度升温，在升温至500℃时放入废靶，再升温至4000‑5000℃，可以对废靶完全汽化，很好的控制废靶全部汽化，制得的ITO粉纯度高，废靶利用效果好。
Waste ITO target recycling method
一种ITO靶材废靶循环利用方法
ZENG DUNFENG (author) / WANG ZHIQIANG (author) / SHI YU (author) / TAO CHENG (author)
2021-09-14
Patent
Electronic Resource
Chinese
IPC:
C04B
Kalk
,
LIME
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