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Preparation method of ITO ceramic target material
The invention provides a preparation method of an ITO (indium tin oxide) ceramic target material, which comprises the following steps: performing wet ball-milling mixing on In2O3 powder and SnO2 powder with the purity of 99.99% according to the mass ratio of (90-97): (10-3), and adding a small amount of organic additive in the ball-milling process to obtain ITO slurry with good flowing property; allowing the obtained ITO slurry to be subjected to spray granulation to obtain spherical ITO granulation powder ; carrying out compression molding on the obtained ITO granulation powder to obtain an ITO biscuit with a regular shape; then carrying out cold isostatic pressing secondary pressing on the ITO biscuit; degreasing the ITO biscuit subjected to cold isostatic pressing at low temperature to remove the organic additive; and carrying out hot isostatic pressing sintering on the degreased ITO biscuit to prepare the ITO target material with high density and low resistivity. In the hot isostatic pressing treatment process, low-carbon steel is selected as a sheath, stainless steel is used as an isolation material to prevent the sheath from reacting with the target material, and later stripping is facilitated. According to the method, the sintering temperature and the sintering time required in the ITO target material preparation process are effectively reduced, the problem that the production period of a traditional normal-pressure sintering process is too long is solved, and the method plays a crucial role in improving the production efficiency of the target material.
本发明提供了一种ITO陶瓷靶材的制备方法，包括以下步骤：将纯度为99.99%的In2O3粉末和SnO2粉末按质量比为(90～97):(10～3)进行湿法球磨混合，球磨过程加入少量有机添加剂，得到流动性能良好的ITO浆料；将所得的ITO浆料进行喷雾造粒，得到的球形状ITO造粒粉；将所得的ITO造粒粉进行模压成型得到形状规则的ITO素坯；之后ITO素坯进行冷等静压二次压制；将冷等静压后的ITO素坯低温脱脂去除有机添加剂；将脱脂后的ITO素坯进行热等静压烧结制备出高致密度、低电阻率的ITO靶材。热等静压处理过程中选用低碳钢作为包套，不锈钢作为隔离材料，以防包套与靶材反应，便于后期剥离。本发明有效地降低了制备ITO靶材过程中所需的烧结温度及烧结时间，解决了传统常压烧结工艺生产周期过长的问题，对于提高靶材生产效率起着至关重要的意义。
Preparation method of ITO ceramic target material
The invention provides a preparation method of an ITO (indium tin oxide) ceramic target material, which comprises the following steps: performing wet ball-milling mixing on In2O3 powder and SnO2 powder with the purity of 99.99% according to the mass ratio of (90-97): (10-3), and adding a small amount of organic additive in the ball-milling process to obtain ITO slurry with good flowing property; allowing the obtained ITO slurry to be subjected to spray granulation to obtain spherical ITO granulation powder ; carrying out compression molding on the obtained ITO granulation powder to obtain an ITO biscuit with a regular shape; then carrying out cold isostatic pressing secondary pressing on the ITO biscuit; degreasing the ITO biscuit subjected to cold isostatic pressing at low temperature to remove the organic additive; and carrying out hot isostatic pressing sintering on the degreased ITO biscuit to prepare the ITO target material with high density and low resistivity. In the hot isostatic pressing treatment process, low-carbon steel is selected as a sheath, stainless steel is used as an isolation material to prevent the sheath from reacting with the target material, and later stripping is facilitated. According to the method, the sintering temperature and the sintering time required in the ITO target material preparation process are effectively reduced, the problem that the production period of a traditional normal-pressure sintering process is too long is solved, and the method plays a crucial role in improving the production efficiency of the target material.
本发明提供了一种ITO陶瓷靶材的制备方法，包括以下步骤：将纯度为99.99%的In2O3粉末和SnO2粉末按质量比为(90～97):(10～3)进行湿法球磨混合，球磨过程加入少量有机添加剂，得到流动性能良好的ITO浆料；将所得的ITO浆料进行喷雾造粒，得到的球形状ITO造粒粉；将所得的ITO造粒粉进行模压成型得到形状规则的ITO素坯；之后ITO素坯进行冷等静压二次压制；将冷等静压后的ITO素坯低温脱脂去除有机添加剂；将脱脂后的ITO素坯进行热等静压烧结制备出高致密度、低电阻率的ITO靶材。热等静压处理过程中选用低碳钢作为包套，不锈钢作为隔离材料，以防包套与靶材反应，便于后期剥离。本发明有效地降低了制备ITO靶材过程中所需的烧结温度及烧结时间，解决了传统常压烧结工艺生产周期过长的问题，对于提高靶材生产效率起着至关重要的意义。
Preparation method of ITO ceramic target material
一种ITO陶瓷靶材的制备方法
WANG YONGCHAO (author) / ZHAO ZELIANG (author) / JIA SHIJUN (author) / YOU QINGWEN (author)
2021-12-03
Patent
Electronic Resource
Chinese
IPC:
C04B
Kalk
,
LIME
/
B28B
Formgeben von Ton oder anderen keramischen Stoffzusammensetzungen, Schlacke oder von Mischungen, die zementartiges Material enthalten, z.B. Putzmörtel
,
SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG OR MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
/
C23C
Beschichten metallischer Werkstoffe
,
COATING METALLIC MATERIAL
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