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High frequency polishing of ceramics
A method of polishing a surface of a polycrystalline sintered ceramic body, the method comprising the steps of: a) providing a sintered ceramic body comprising a polycrystalline material and having a density of from about 99.5% to about 99.999% of a theoretical density of the polycrystalline material wherein the sintered ceramic body has at least one surface; b) grinding the at least one surface until the surface has (I) an average flatness of no more than 25 microns as measured using a sphere diameter meter at angles of 0 DEG, 90 DEG, 180 DEG and 270 DEG over four quadrants of the at least one surface, (ii) an Ra of less than 14 microinches, and (iii) an Rz of less than 160 microinches; c) after the grinding step, lapping the at least one surface with a lapping plate and a lapping medium slurry; d) after lapping, continuously polishing the at least one surface in a series of polishing steps until the at least one surface exhibits an Ra value of < = 2 microinches and an Rz of < = 2 microinches and an absolute value of flatness of greater than 15 microns (as measured using a ball diameter gauge) wherein the polishing is performed using a device comprising a plurality of orbital sand mills that oscillate elliptically, each of the orbital sands comprises a polishing pad to contact the at least one surface during polishing, where the series of polishing steps comprises: i) a first polishing step where the polishing pad is used with a slurry of 4 [mu] m to 10 [mu] m coarse sand particles; and ii) a second polishing step, wherein the polishing pad is used with a slurry of 1 micron to 3 micron coarse sand particles.
一种抛光多晶烧结陶瓷体的表面的方法，该方法包括以下步骤：a)提供烧结陶瓷体，该烧结陶瓷体包括多晶材料并且具有该多晶材料的理论密度的约99.5％至约99.999％的密度，其中该烧结陶瓷体具有至少一个表面；b)研磨该至少一个表面，直至该表面具有(I)如使用球径计所测量，在该至少一个表面的四个象限上以0°、90°、180°和270°的角度测量的平均不大于25微米的平面度，(ii)小于14微英寸的Ra，以及(iii)小于160微英寸的Rz；c)在该研磨步骤之后，用精研板和精研介质浆料精研该至少一个表面；d)在精研之后，在一系列抛光步骤中连续地抛光该至少一个表面，直至该至少一个表面呈现≤2微英寸的Ra值和≤2微英寸的Rz以及大于15微米的平面度的绝对值(如使用球径计所测量)，其中该抛光使用包括椭圆振动的多个轨道砂磨机的装置进行，该轨道砂磨机中的每一个轨道砂磨机包括抛光垫以在抛光期间接触该至少一个表面，其中该一系列抛光步骤包括：i)第一抛光步骤，其中该抛光垫与4微米至10微米粗砂颗粒的浆料一起使用；以及ii)第二抛光步骤，其中该抛光垫与1微米至3微米粗砂颗粒的浆料一起使用。
High frequency polishing of ceramics
A method of polishing a surface of a polycrystalline sintered ceramic body, the method comprising the steps of: a) providing a sintered ceramic body comprising a polycrystalline material and having a density of from about 99.5% to about 99.999% of a theoretical density of the polycrystalline material wherein the sintered ceramic body has at least one surface; b) grinding the at least one surface until the surface has (I) an average flatness of no more than 25 microns as measured using a sphere diameter meter at angles of 0 DEG, 90 DEG, 180 DEG and 270 DEG over four quadrants of the at least one surface, (ii) an Ra of less than 14 microinches, and (iii) an Rz of less than 160 microinches; c) after the grinding step, lapping the at least one surface with a lapping plate and a lapping medium slurry; d) after lapping, continuously polishing the at least one surface in a series of polishing steps until the at least one surface exhibits an Ra value of < = 2 microinches and an Rz of < = 2 microinches and an absolute value of flatness of greater than 15 microns (as measured using a ball diameter gauge) wherein the polishing is performed using a device comprising a plurality of orbital sand mills that oscillate elliptically, each of the orbital sands comprises a polishing pad to contact the at least one surface during polishing, where the series of polishing steps comprises: i) a first polishing step where the polishing pad is used with a slurry of 4 [mu] m to 10 [mu] m coarse sand particles; and ii) a second polishing step, wherein the polishing pad is used with a slurry of 1 micron to 3 micron coarse sand particles.
一种抛光多晶烧结陶瓷体的表面的方法，该方法包括以下步骤：a)提供烧结陶瓷体，该烧结陶瓷体包括多晶材料并且具有该多晶材料的理论密度的约99.5％至约99.999％的密度，其中该烧结陶瓷体具有至少一个表面；b)研磨该至少一个表面，直至该表面具有(I)如使用球径计所测量，在该至少一个表面的四个象限上以0°、90°、180°和270°的角度测量的平均不大于25微米的平面度，(ii)小于14微英寸的Ra，以及(iii)小于160微英寸的Rz；c)在该研磨步骤之后，用精研板和精研介质浆料精研该至少一个表面；d)在精研之后，在一系列抛光步骤中连续地抛光该至少一个表面，直至该至少一个表面呈现≤2微英寸的Ra值和≤2微英寸的Rz以及大于15微米的平面度的绝对值(如使用球径计所测量)，其中该抛光使用包括椭圆振动的多个轨道砂磨机的装置进行，该轨道砂磨机中的每一个轨道砂磨机包括抛光垫以在抛光期间接触该至少一个表面，其中该一系列抛光步骤包括：i)第一抛光步骤，其中该抛光垫与4微米至10微米粗砂颗粒的浆料一起使用；以及ii)第二抛光步骤，其中该抛光垫与1微米至3微米粗砂颗粒的浆料一起使用。
High frequency polishing of ceramics
陶瓷的高频抛光
WALKER LUKE (author) / DORON MICHAEL J (author) / WAGHMARE SWAPNIL (author)
2024-11-01
Patent
Electronic Resource
Chinese
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