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OXIDE SINTERED BODY AND TRANSPARENT CONDUCTIVE OXIDE FILM
Provided are an oxide sintered body that can produce a transparent conductive oxide film having low resistance and exhibiting lower light absorption characteristics in a wide wavelength range, and a transparent conductive oxide film. An oxide sintered body containing indium, hafnium, tantalum, and oxygen as constituent elements, in which when indium, hafnium, and tantalum are designated as In, Hf, and Ta, respectively, the atomic ratio Hf/(In + Hf + Ta) is 0.2 at% to 3.0 at%, and the atomic ratio Ta/(In + Hf+ Ta) is 0.02 at% to 1.3 at%, is used.
OXIDE SINTERED BODY AND TRANSPARENT CONDUCTIVE OXIDE FILM
Provided are an oxide sintered body that can produce a transparent conductive oxide film having low resistance and exhibiting lower light absorption characteristics in a wide wavelength range, and a transparent conductive oxide film. An oxide sintered body containing indium, hafnium, tantalum, and oxygen as constituent elements, in which when indium, hafnium, and tantalum are designated as In, Hf, and Ta, respectively, the atomic ratio Hf/(In + Hf + Ta) is 0.2 at% to 3.0 at%, and the atomic ratio Ta/(In + Hf+ Ta) is 0.02 at% to 1.3 at%, is used.
OXIDE SINTERED BODY AND TRANSPARENT CONDUCTIVE OXIDE FILM
OXIDSINTERKÖRPER UND LEITFÄHIGE TRANSPARENTE OXIDSCHICHT
CORPS D'OXYDE FRITTÉ ET FILM D'OXYDE CONDUCTEUR TRANSPARENT
AKIIKE RYO (author) / TSUCHIDA YUYA (author) / KURAMOCHI HIDETO (author)
2022-01-26
Patent
Electronic Resource
English
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