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ELECTRODE PLATE FOR PLASMA TREATMENT DEVICE AND METHOD FOR REGENERATING THE SAME
PROBLEM TO BE SOLVED: To provide an electrode plate for a plasma treatment device in which an inner wall of a vent hole is hardly worn.SOLUTION: An electrode plate for a plasma treatment device having a vent hole through which gas for producing plasma passes includes: a substrate; and a coating layer provided at least one of a surfaces of the substrate. The substrate is formed with a material with plasma resistance that is higher than that of a material forming the coating layer.SELECTED DRAWING: Figure 1
【課題】通気孔の内壁が消耗しにくいプラズマ処理装置用電極板を提供する。【解決手段】プラズマ生成用のガスを通過させる通気孔を有するプラズマ処理装置用電極板であって、基材と、前記基材の少なくとも一方の表面に設けられたコーティング層とを有し、前記基材は、前記コーティング層を形成している材料よりも耐プラズマ性が高い材料により形成されていることを特徴とするプラズマ処理装置用電極板。【選択図】図1
ELECTRODE PLATE FOR PLASMA TREATMENT DEVICE AND METHOD FOR REGENERATING THE SAME
PROBLEM TO BE SOLVED: To provide an electrode plate for a plasma treatment device in which an inner wall of a vent hole is hardly worn.SOLUTION: An electrode plate for a plasma treatment device having a vent hole through which gas for producing plasma passes includes: a substrate; and a coating layer provided at least one of a surfaces of the substrate. The substrate is formed with a material with plasma resistance that is higher than that of a material forming the coating layer.SELECTED DRAWING: Figure 1
【課題】通気孔の内壁が消耗しにくいプラズマ処理装置用電極板を提供する。【解決手段】プラズマ生成用のガスを通過させる通気孔を有するプラズマ処理装置用電極板であって、基材と、前記基材の少なくとも一方の表面に設けられたコーティング層とを有し、前記基材は、前記コーティング層を形成している材料よりも耐プラズマ性が高い材料により形成されていることを特徴とするプラズマ処理装置用電極板。【選択図】図1
ELECTRODE PLATE FOR PLASMA TREATMENT DEVICE AND METHOD FOR REGENERATING THE SAME
プラズマ処理装置用電極板およびプラズマ処理装置用電極板の再生方法
NOMURA SATOSHI (author) / FUJIMORI SHUJI (author)
2018-08-23
Patent
Electronic Resource
Japanese
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