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BASE ISOLATION STRUCTURE AND DESIGN METHOD FOR BASE ISOLATION STRUCTURE
To enhance the degree of freedom for an installation position of a relative deformation control mechanism used in a base isolation structure.SOLUTION: A base isolation structure for a building has a superstructure 15, a substructure 13, and a base isolation layer 11 between the superstructure 15 and the substructure 13. The base isolation layer 11 comprises: a protrusion part 21 belonging to one of the superstructure 15 and the substructure 13; an excessive deformation control mechanism 20 belonging to the other of superstructure 15 and substructure 13, having the same center as the center of the protrusion part 21 and having a surrounding part 22 surrounding the protrusion part 21 at a distance from the protrusion part 21; and a base isolation device 12 provided on the outside of the excessive deformation control mechanism 20. The outer peripheral surface of the protrusion part 21 or the inner peripheral surface of the surrounding part 22 has a plurality of planes allocated so that the shortest distances between the outer peripheral surface and the inner peripheral surface are equal.SELECTED DRAWING: Figure 1
【課題】免震構造に用いる相対変形制御機構の設置位置の自由度を高める。【解決手段】上部構造15、下部構造13、及び上部構造15及び下部構造13の間の免震層11を有する建物の免震構造であって、免震層11は、上部構造15及び下部構造13の一方に属する突出部21と、上部構造15及び下部構造13の他方に属し、突出部21の中心と同じ中心を有し、突出部21との間に間隔を設けて突出部21を囲繞する囲繞部22とを有する過大変形制御機構20と、過大変形制御機構20の外側に設けられた免震装置12とを備え、突出部21の外周面又は囲繞部22の内周面は、外周面及び内周面の最短距離が等しくなるように割り付けられた複数の平面を有する。【選択図】図1
BASE ISOLATION STRUCTURE AND DESIGN METHOD FOR BASE ISOLATION STRUCTURE
To enhance the degree of freedom for an installation position of a relative deformation control mechanism used in a base isolation structure.SOLUTION: A base isolation structure for a building has a superstructure 15, a substructure 13, and a base isolation layer 11 between the superstructure 15 and the substructure 13. The base isolation layer 11 comprises: a protrusion part 21 belonging to one of the superstructure 15 and the substructure 13; an excessive deformation control mechanism 20 belonging to the other of superstructure 15 and substructure 13, having the same center as the center of the protrusion part 21 and having a surrounding part 22 surrounding the protrusion part 21 at a distance from the protrusion part 21; and a base isolation device 12 provided on the outside of the excessive deformation control mechanism 20. The outer peripheral surface of the protrusion part 21 or the inner peripheral surface of the surrounding part 22 has a plurality of planes allocated so that the shortest distances between the outer peripheral surface and the inner peripheral surface are equal.SELECTED DRAWING: Figure 1
【課題】免震構造に用いる相対変形制御機構の設置位置の自由度を高める。【解決手段】上部構造15、下部構造13、及び上部構造15及び下部構造13の間の免震層11を有する建物の免震構造であって、免震層11は、上部構造15及び下部構造13の一方に属する突出部21と、上部構造15及び下部構造13の他方に属し、突出部21の中心と同じ中心を有し、突出部21との間に間隔を設けて突出部21を囲繞する囲繞部22とを有する過大変形制御機構20と、過大変形制御機構20の外側に設けられた免震装置12とを備え、突出部21の外周面又は囲繞部22の内周面は、外周面及び内周面の最短距離が等しくなるように割り付けられた複数の平面を有する。【選択図】図1
BASE ISOLATION STRUCTURE AND DESIGN METHOD FOR BASE ISOLATION STRUCTURE
免震構造及び免震構造の設計方法
KASHIMATA AKIKO (author) / TANAKA YOSHIKAZU (author) / SAITO MOTOTSUGU (author)
2020-12-03
Patent
Electronic Resource
Japanese
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