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A platform for research: civil engineering, architecture and urbanism
SPUTTERING TARGET, MANUFACTURING METHOD OF SPUTTERING TARGET, AND OPTICAL FUNCTION FILM
To provide a sputtering target capable of efficiently and stably depositing an optical function film having an excellent heat resistance and an excellent alkaline resistance and being capable of sufficiently suppressing a light reflection from a metal thin film and the like, a manufacturing method of the same, and an optical function film.SOLUTION: A sputtering target contains one type or two types or more of a metal phase selected from Nb, W, and Ti and a zinc oxide phase, has a density ratio of 80% or more. A standard deviation of each content consisting of one type or two types or more of metal elements selected from Nb, W, and Ti, which is measured at multiple locations of a sputtering surface, is 5 mass% or less.SELECTED DRAWING: None
【課題】耐熱性および耐アルカリ性に優れ、金属薄膜等からの光の反射を十分に抑制することが可能な光学機能膜を効率良く安定して成膜可能な、スパッタリングターゲット、その製造方法、及び光学機能膜を提供する。【解決手段】Ｎｂ，Ｗ，Ｔｉから選択される一種又は二種以上の金属相と、酸化亜鉛相と、を含み、密度比が８０％以上であり、スパッタ面の複数の箇所で測定したＮｂ，Ｗ，Ｔｉから選択される一種又は二種以上からなる金属元素のそれぞれの含有量の標準偏差が５ｍａｓｓ％以下とされていることを特徴とするスパッタリングターゲット。【選択図】なし
SPUTTERING TARGET, MANUFACTURING METHOD OF SPUTTERING TARGET, AND OPTICAL FUNCTION FILM
To provide a sputtering target capable of efficiently and stably depositing an optical function film having an excellent heat resistance and an excellent alkaline resistance and being capable of sufficiently suppressing a light reflection from a metal thin film and the like, a manufacturing method of the same, and an optical function film.SOLUTION: A sputtering target contains one type or two types or more of a metal phase selected from Nb, W, and Ti and a zinc oxide phase, has a density ratio of 80% or more. A standard deviation of each content consisting of one type or two types or more of metal elements selected from Nb, W, and Ti, which is measured at multiple locations of a sputtering surface, is 5 mass% or less.SELECTED DRAWING: None
【課題】耐熱性および耐アルカリ性に優れ、金属薄膜等からの光の反射を十分に抑制することが可能な光学機能膜を効率良く安定して成膜可能な、スパッタリングターゲット、その製造方法、及び光学機能膜を提供する。【解決手段】Ｎｂ，Ｗ，Ｔｉから選択される一種又は二種以上の金属相と、酸化亜鉛相と、を含み、密度比が８０％以上であり、スパッタ面の複数の箇所で測定したＮｂ，Ｗ，Ｔｉから選択される一種又は二種以上からなる金属元素のそれぞれの含有量の標準偏差が５ｍａｓｓ％以下とされていることを特徴とするスパッタリングターゲット。【選択図】なし
SPUTTERING TARGET, MANUFACTURING METHOD OF SPUTTERING TARGET, AND OPTICAL FUNCTION FILM
スパッタリングターゲット、スパッタリングターゲットの製造方法、および、光学機能膜
UMEMOTO KEITA (author) / KANEKO DAISUKE (author) / SUGIUCHI YUKIYA (author) / OKANO SUSUMU (author) / OTOMO KENJI (author)
2021-12-23
Patent
Electronic Resource
Japanese
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