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OXIDE SINTERED BODY, MANUFACTURING METHOD THEREOF AND SPUTTERING TARGET MATERIAL
To provide an oxide sintered body having few defects such as pinholes, and hardly causing abnormal discharge or cracking when used as a sputtering target material, and a manufacturing method thereof, and the sputtering target material.SOLUTION: The oxide sintered body contains tin element, tantalum element and niobium element. An area ratio of pores per unit area in cross-sectional observation of the oxide sintered body is 1% or less. A maximum equivalent circular diameter of the pores in cross-sectional observation of the oxide sintered body is 20 μm or less. A maximum Feret diameter of the pores in cross-sectional observation of the oxide sintered body is 50 μm or less. A flexural strength of the oxide sintered body measured in accordance with JIS R1601 is 180 MPa or more.SELECTED DRAWING: None
【課題】ピンホール等の欠陥が少なく、スパッタリングターゲット材として用いた場合に異常放電や割れが発生しづらい酸化物焼結体及びその製造方法並びにスパッタリングターゲット材を提供すること。【解決手段】酸化物焼結体は、スズ元素、タンタル元素及びニオブ元素を含む。酸化物焼結体の断面観察における単位面積当たりの孔部の面積率が１％以下である。酸化物焼結体の断面観察における孔部の最大円相当径が２０μｍ以下である。酸化物焼結体の断面観察における孔部の最大フェレ径が５０μｍ以下である。ＪＩＳ Ｒ１６０１に準拠して測定された酸化物焼結体の抗折強度が１８０ＭＰａ以上である。【選択図】なし
OXIDE SINTERED BODY, MANUFACTURING METHOD THEREOF AND SPUTTERING TARGET MATERIAL
To provide an oxide sintered body having few defects such as pinholes, and hardly causing abnormal discharge or cracking when used as a sputtering target material, and a manufacturing method thereof, and the sputtering target material.SOLUTION: The oxide sintered body contains tin element, tantalum element and niobium element. An area ratio of pores per unit area in cross-sectional observation of the oxide sintered body is 1% or less. A maximum equivalent circular diameter of the pores in cross-sectional observation of the oxide sintered body is 20 μm or less. A maximum Feret diameter of the pores in cross-sectional observation of the oxide sintered body is 50 μm or less. A flexural strength of the oxide sintered body measured in accordance with JIS R1601 is 180 MPa or more.SELECTED DRAWING: None
【課題】ピンホール等の欠陥が少なく、スパッタリングターゲット材として用いた場合に異常放電や割れが発生しづらい酸化物焼結体及びその製造方法並びにスパッタリングターゲット材を提供すること。【解決手段】酸化物焼結体は、スズ元素、タンタル元素及びニオブ元素を含む。酸化物焼結体の断面観察における単位面積当たりの孔部の面積率が１％以下である。酸化物焼結体の断面観察における孔部の最大円相当径が２０μｍ以下である。酸化物焼結体の断面観察における孔部の最大フェレ径が５０μｍ以下である。ＪＩＳ Ｒ１６０１に準拠して測定された酸化物焼結体の抗折強度が１８０ＭＰａ以上である。【選択図】なし
OXIDE SINTERED BODY, MANUFACTURING METHOD THEREOF AND SPUTTERING TARGET MATERIAL
酸化物焼結体及びその製造方法並びにスパッタリングターゲット材
FUKAGAWA KOJI (author)
2024-06-21
Patent
Electronic Resource
Japanese
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