Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    スパッタリングターゲット

    To provide a sputtering target to which direct-current sputtering is allowed, and which can control a thin film composition after sputtering to a desired composition.SOLUTION: A sputtering target includes Mg, Ti, O and N based on the compositions as 0<50 at%, 0

    Access

    Download

    Access

    Download

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    スパッタリングターゲット

    To provide a sputtering target to which direct-current sputtering is allowed, and which can control a thin film composition after sputtering to a desired composition.SOLUTION: A sputtering target includes Mg, Ti, O and N based on the compositions as 0<50 at%, 0

    Access

    Download

    スパッタリングターゲット

    To provide a sputtering target to which direct-current sputtering is allowed, and which can control a thin film composition after sputtering to a desired composition.SOLUTION: A sputtering target includes Mg, Ti, O and N based on the compositions as 0<50 at%, 0

    Access

    Download

    Access

    Download

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    スパッタリングターゲット

    Publication date:

    2022-04-19

    Type of media:

    Patent

    Type of material:

    Electronic Resource

    Language:

    Japanese

    Classification:

    IPC:  C04B Kalk , LIME / C23C Beschichten metallischer Werkstoffe , COATING METALLIC MATERIAL / G11B Informationsspeicherung mit Relativbewegung zwischen Aufzeichnungsträger und Wandler , INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER

    Similar titles

    スパッタリングターゲット材、及びスパッタリングターゲット

    European Patent Office | 2019

    Free access

    スパッタリングターゲット

    European Patent Office | 2016

    Free access

    スパッタリングターゲット

    European Patent Office | 2018

    Free access

    スパッタリングターゲット

    European Patent Office | 2023

    Free access

    スパッタリングターゲット

    European Patent Office | 2019

    Free access
    Back to top