A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
ＩＧＺＯスパッタリングターゲット
To provide IGZO sputtering target capable of improving uniformity for at least one characteristic selected from the number of micro cracks in tissue, the number of pores in sintered body structure, and surface roughness.SOLUTION: The present IGZO sputtering target is a sputtering target having an oxide sintered body comprising indium (In), gallium (Ga), zinc (Zn) and inevitable impurities. On a surface of the oxide sintered body, ΔL* determined by subtracting brightness Lc* in a central part of the surface from brightness Le* at a position of 10 mm from the end of the surface to the central side satisfies ΔL*<3.0, and a relative density of the oxide sintered body is 97.0% or more.SELECTED DRAWING: None
ＩＧＺＯスパッタリングターゲット
To provide IGZO sputtering target capable of improving uniformity for at least one characteristic selected from the number of micro cracks in tissue, the number of pores in sintered body structure, and surface roughness.SOLUTION: The present IGZO sputtering target is a sputtering target having an oxide sintered body comprising indium (In), gallium (Ga), zinc (Zn) and inevitable impurities. On a surface of the oxide sintered body, ΔL* determined by subtracting brightness Lc* in a central part of the surface from brightness Le* at a position of 10 mm from the end of the surface to the central side satisfies ΔL*<3.0, and a relative density of the oxide sintered body is 97.0% or more.SELECTED DRAWING: None