A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
- IZO INDIUM ZINC OXIDE IZO BASED SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
The present invention relates to an indium oxide-indium zinc oxide (IZO) based sputtering target and a method for producing the same. The sputtering target contains In, Zn and O and is characterized in that the atom ratio of Zn and In meets a formula: 0.05 <= Zn/(In + Zn) <= 0.30 and the standard deviation of the bulk resistivity in the sputtering face of the target is below 1.0 mΩ·cm. The present invention provides a manufacture method for producing the IZO based sputtering target with small sintering body warping and inhibiting in-plane deviation of the bulk resistivity caused by grinding used for reducing warping.
In, Zn, O 로 이루어지는 스퍼터링 타깃으로서, Zn 과 In 의 원자비가 0.05 ≤ Zn/(In ＋ Zn) ≤ 0.30 을 만족시키고, 그 타깃의 스퍼터 면에 있어서의 벌크 저항률의 표준 편차가 0.1 mΩ·㎝ 이하인 것을 특징으로 하는 스퍼터링 타깃. 소결체의 휨이 적고, 휨 저감을 위한 연삭에 의한 벌크 저항률의 면내 편차가 억제된 산화인듐-산화아연계 산화물 (IZO) 소결체 타깃의 제조 방법을 제공한다.
- IZO INDIUM ZINC OXIDE IZO BASED SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
The present invention relates to an indium oxide-indium zinc oxide (IZO) based sputtering target and a method for producing the same. The sputtering target contains In, Zn and O and is characterized in that the atom ratio of Zn and In meets a formula: 0.05 <= Zn/(In + Zn) <= 0.30 and the standard deviation of the bulk resistivity in the sputtering face of the target is below 1.0 mΩ·cm. The present invention provides a manufacture method for producing the IZO based sputtering target with small sintering body warping and inhibiting in-plane deviation of the bulk resistivity caused by grinding used for reducing warping.
In, Zn, O 로 이루어지는 스퍼터링 타깃으로서, Zn 과 In 의 원자비가 0.05 ≤ Zn/(In ＋ Zn) ≤ 0.30 을 만족시키고, 그 타깃의 스퍼터 면에 있어서의 벌크 저항률의 표준 편차가 0.1 mΩ·㎝ 이하인 것을 특징으로 하는 스퍼터링 타깃. 소결체의 휨이 적고, 휨 저감을 위한 연삭에 의한 벌크 저항률의 면내 편차가 억제된 산화인듐-산화아연계 산화물 (IZO) 소결체 타깃의 제조 방법을 제공한다.
- IZO INDIUM ZINC OXIDE IZO BASED SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
산화인듐-산화아연계 (IZO) 스퍼터링 타깃 및 그 제조 방법
KAKENO TAKASHI (author)
2019-02-26
Patent
Electronic Resource
Korean
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