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A platform for research: civil engineering, architecture and urbanism
Chamber and substrate processing apparatus having the same
The present invention relates to a substrate processing device, and more specifically to a chamber forming a space for substrate processing and a substrate processing device having the same. According to the present invention, the chamber is disclosed which comprises: a chamber main body (100) forming an internal space (S) and having an opening portion (101); an opening and closing door (200) provided to open and close the opening portion (101); and a hinge portion installed so that the opening and closing door (200) can be hinged and rotated on the chamber main body (100). The hinge portion includes one or more first hinge portions (300) and one or more second hinge portions (400) which bind the chamber main body (100) and the opening and closing door (200). In addition, the first hinge portion (300) binds the chamber main body (100) and the opening and closing door (200) with a greater binding strength than the second hinge portion (400), and the second hinge portion (400) has greater friction due to hinge rotation than the first hinge portion (300). Accordingly, sagging and twisting of the opening and closing door is prevented and at the same time, opening and closing stability is ensured.
본 발명은 기판처리장치에 관한 것으로서, 보다 상세하게는 기판처리를 위한 공간을 형성하는 챔버 및 이를 구비하는 기판처리장치에 관한 것이다. 본 발명은, 내부공간(S)을 형성하며, 개구부(101)가 구비되는 챔버본체(100)와; 상기 개구부(101)를 개폐하도록 구비되는 개폐도어(200)와; 상기 개폐도어(200)가 상기 챔버본체(100)에 힌지회전 가능하도록 설치되는 힌지부를 포함하며, 상기 힌지부는, 상기 챔버본체(100)와 상기 개폐도어(200) 사이를 결속하는 하나 이상의 제1힌지부(300) 및 하나 이상의 제2힌지부(200)를 포함하며, 상기 제1힌지부(300)는, 상기 제2힌지부(400) 보다 큰 결속강도로 상기 챔버본체(100)와 상기 개폐도어(200) 사이를 결속하고, 상기 제2힌지부(400)는, 상기 제1힌지부(300) 보다 힌지회전에 따른 마찰력이 큰 챔버를 개시한다.
Chamber and substrate processing apparatus having the same
The present invention relates to a substrate processing device, and more specifically to a chamber forming a space for substrate processing and a substrate processing device having the same. According to the present invention, the chamber is disclosed which comprises: a chamber main body (100) forming an internal space (S) and having an opening portion (101); an opening and closing door (200) provided to open and close the opening portion (101); and a hinge portion installed so that the opening and closing door (200) can be hinged and rotated on the chamber main body (100). The hinge portion includes one or more first hinge portions (300) and one or more second hinge portions (400) which bind the chamber main body (100) and the opening and closing door (200). In addition, the first hinge portion (300) binds the chamber main body (100) and the opening and closing door (200) with a greater binding strength than the second hinge portion (400), and the second hinge portion (400) has greater friction due to hinge rotation than the first hinge portion (300). Accordingly, sagging and twisting of the opening and closing door is prevented and at the same time, opening and closing stability is ensured.
본 발명은 기판처리장치에 관한 것으로서, 보다 상세하게는 기판처리를 위한 공간을 형성하는 챔버 및 이를 구비하는 기판처리장치에 관한 것이다. 본 발명은, 내부공간(S)을 형성하며, 개구부(101)가 구비되는 챔버본체(100)와; 상기 개구부(101)를 개폐하도록 구비되는 개폐도어(200)와; 상기 개폐도어(200)가 상기 챔버본체(100)에 힌지회전 가능하도록 설치되는 힌지부를 포함하며, 상기 힌지부는, 상기 챔버본체(100)와 상기 개폐도어(200) 사이를 결속하는 하나 이상의 제1힌지부(300) 및 하나 이상의 제2힌지부(200)를 포함하며, 상기 제1힌지부(300)는, 상기 제2힌지부(400) 보다 큰 결속강도로 상기 챔버본체(100)와 상기 개폐도어(200) 사이를 결속하고, 상기 제2힌지부(400)는, 상기 제1힌지부(300) 보다 힌지회전에 따른 마찰력이 큰 챔버를 개시한다.
Chamber and substrate processing apparatus having the same
챔버 및 이를 구비하는 기판처리장치
KIM KI YOUL (author)
2023-06-23
Patent
Electronic Resource
Korean
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