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Member for plasma processing apparatus, plasma processing apparatus with the same and method for using sintered body
A member for a plasma processing apparatus has a tungsten carbide phase, and a sub-phase including at least one selected from the group consisting of phase I to IV, and phase V, in which the phase I is a carbide phase containing, as a constituent element, at least one of the elements of Group IV, V, and VI of the periodic table excluding W, the phase II is a nitride phase containing, as a constituent element, at least one of the elements of Group IV, V, and VI of the periodic table excluding W, the phase III is a carbonitride phase containing, as a constituent element, at least one of the elements of Group IV, Group V, and Group VI of the periodic table excluding W, the phase IV is a carbon phase, the phase V is a composite carbide phase which is represented by a formula WxMyCz.
Member for plasma processing apparatus, plasma processing apparatus with the same and method for using sintered body
A member for a plasma processing apparatus has a tungsten carbide phase, and a sub-phase including at least one selected from the group consisting of phase I to IV, and phase V, in which the phase I is a carbide phase containing, as a constituent element, at least one of the elements of Group IV, V, and VI of the periodic table excluding W, the phase II is a nitride phase containing, as a constituent element, at least one of the elements of Group IV, V, and VI of the periodic table excluding W, the phase III is a carbonitride phase containing, as a constituent element, at least one of the elements of Group IV, Group V, and Group VI of the periodic table excluding W, the phase IV is a carbon phase, the phase V is a composite carbide phase which is represented by a formula WxMyCz.
Member for plasma processing apparatus, plasma processing apparatus with the same and method for using sintered body
IKEDA TAKASHI (author) / ISHII HAJIME (author) / FUJIMOTO KENJI (author) / SATOH NAOYUKI (author) / NAGAYAMA NOBUYUKI (author) / MURAKAMI KOICHI (author) / MURAKAMI TAKAHIRO (author)
2022-09-06
Patent
Electronic Resource
English
IPC:
C04B
Kalk
,
LIME
/
C23F
Nichtmechanisches Entfernen metallischer Stoffe von Oberflächen
,
NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES
/
H01J
Elektrische Entladungsröhren oder Entladungslampen
,
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
/
H01L
Halbleiterbauelemente
,
SEMICONDUCTOR DEVICES
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