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Anisotropic etching of silicon nitride at low temperatures by synchrotron radiation

Kitamura, O. / Goto, T. / Terakado, S. / Suzuki, S.

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Anisotropic etching of silicon nitride at low temperatures by synchrotron radiation

Kitamura, O. / Goto, T. / Terakado, S. / Suzuki, S.

Anisotropic etching of silicon nitride at low temperatures by synchrotron radiation

Kitamura, O. / Goto, T. / Terakado, S. / Suzuki, S.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Anisotropic etching of silicon nitride at low temperatures by synchrotron radiation

Contributors:

Kitamura, O. (author) / Goto, T. (author) / Terakado, S. (author) / Suzuki, S. (author)

Published in:

APPLIED SURFACE SCIENCE ; 79/80 ; 122

Publication date:

1994-01-01

Size:

122 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 621.35

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