A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
ALUMINUM NITRIDE FILM, METHOD FOR MANUFACTURING ALUMINUM NITRIDE FILM, AND HIGH-BREAKDOWN-VOLTAGE COMPONENT
An aluminum nitride film according to the present invention includes polycrystalline aluminum nitride. The dielectric strength voltage of the aluminum nitride film is at least 100 kV/mm.
Un film de nitrure d'aluminium selon la présente invention comprend du nitrure d'aluminium polycristallin. La tension de résistance diélectrique du film de nitrure d'aluminium est d'au moins 100 kV/mm.
窒化アルミニウム膜は、多結晶の窒化アルミニウムを含む。窒化アルミニウム膜の絶縁耐圧は１００ｋＶ／ｍｍ以上である。
ALUMINUM NITRIDE FILM, METHOD FOR MANUFACTURING ALUMINUM NITRIDE FILM, AND HIGH-BREAKDOWN-VOLTAGE COMPONENT
An aluminum nitride film according to the present invention includes polycrystalline aluminum nitride. The dielectric strength voltage of the aluminum nitride film is at least 100 kV/mm.
Un film de nitrure d'aluminium selon la présente invention comprend du nitrure d'aluminium polycristallin. La tension de résistance diélectrique du film de nitrure d'aluminium est d'au moins 100 kV/mm.
窒化アルミニウム膜は、多結晶の窒化アルミニウムを含む。窒化アルミニウム膜の絶縁耐圧は１００ｋＶ／ｍｍ以上である。
ALUMINUM NITRIDE FILM, METHOD FOR MANUFACTURING ALUMINUM NITRIDE FILM, AND HIGH-BREAKDOWN-VOLTAGE COMPONENT
FILM DE NITRURE D'ALUMINIUM, PROCÉDÉ DE FABRICATION DE FILM DE NITRURE D'ALUMINIUM ET COMPOSANT À TENSION DE CLAQUAGE ÉLEVÉE
窒化アルミニウム膜、窒化アルミニウム膜の製造方法、および高耐圧部品
YUMOTO ATSUSHI (author) / SHIMIZU MARI (author) / INOUE TETSUO (author) / HINO TAKASHI (author) / SAITO SHUICHI (author)
2017-09-14
Patent
Electronic Resource
Japanese
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