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    Characterization of radio-frequency sputtered AlN films by spectroscopic ellipsometry

    New search for: Huang, D.
    New search for: Uppireddi, K.
    New search for: Pantojas, V. M.
    New search for: Otaño-Rivera, W.
    New search for: Weiner, B. R.
    New search for: Morell, G.

    Polycrystalline aluminum nitride films were deposited by reactive radio frequency magnetron sputtering on silicon and molybdenum substrates without substrate heating. Surface and microstructure properties were investigated by atomic force microscopy and x-ray diffraction. X-ray photoelectron spectroscopy was used to study the composition of the surface. Their optical properties were studied by spectroscopic ellipsometry in the 430-850 nm wavelength range and modeling was carried out. The optical properties so obtained were correlated with the AlN films' structure and crystalline quality.

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    Characterization of radio-frequency sputtered AlN films by spectroscopic ellipsometry

    New search for: Huang, D.
    New search for: Uppireddi, K.
    New search for: Pantojas, V. M.
    New search for: Otaño-Rivera, W.
    New search for: Weiner, B. R.
    New search for: Morell, G.

    Polycrystalline aluminum nitride films were deposited by reactive radio frequency magnetron sputtering on silicon and molybdenum substrates without substrate heating. Surface and microstructure properties were investigated by atomic force microscopy and x-ray diffraction. X-ray photoelectron spectroscopy was used to study the composition of the surface. Their optical properties were studied by spectroscopic ellipsometry in the 430-850 nm wavelength range and modeling was carried out. The optical properties so obtained were correlated with the AlN films' structure and crystalline quality.

    Access

    Check access
    Check availability in my library
    Order at Subito €

    Characterization of radio-frequency sputtered AlN films by spectroscopic ellipsometry

    New search for: Huang, D.
    New search for: Uppireddi, K.
    New search for: Pantojas, V. M.
    New search for: Otaño-Rivera, W.
    New search for: Weiner, B. R.
    New search for: Morell, G.

    Polycrystalline aluminum nitride films were deposited by reactive radio frequency magnetron sputtering on silicon and molybdenum substrates without substrate heating. Surface and microstructure properties were investigated by atomic force microscopy and x-ray diffraction. X-ray photoelectron spectroscopy was used to study the composition of the surface. Their optical properties were studied by spectroscopic ellipsometry in the 430-850 nm wavelength range and modeling was carried out. The optical properties so obtained were correlated with the AlN films' structure and crystalline quality.

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    Title:

    Characterization of radio-frequency sputtered AlN films by spectroscopic ellipsometry

    Contributors:

    Huang, D. (author) / Uppireddi, K. (author) / Pantojas, V. M. (author) / Otaño-Rivera, W. (author) / Weiner, B. R. (author) / Morell, G. (author)

    Conference:

    Nanocoatings ; 2007 ; San Diego,California,United States

    Published in:

    Proc. SPIE ; 6647

    Publication date:

    2007-09-06

    ISBN:

    9780819467959

    ISSN:

    0277-786X

    DOI:

    https://doi.org/10.1117/12.734985

    Type of media:

    Conference paper

    Type of material:

    Electronic Resource

    Language:

    English

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