Ultra-shallow junctions produced by plasma doping and flash lamp annealing

Skorupa, W. / Yankov, R. A. / Anwand, W. et al. | British Library Online Contents | 2004

Ultra-shallow, super-doped and box-like junctions realized by laser-induced doping

Kerrien, G. / Boulmer, J. / Debarre, D. et al. | British Library Online Contents | 2002

Thermal stability of ultra-shallow junctions in silicon formed by molecular-beam epitaxy using boron delta doping

Thompson, P. E. / Bennett, J. | British Library Online Contents | 2002

Non-melt laser annealing of Plasma Implanted Boron for ultra shallow junctions in Silicon

Florakis, A. / Misra, N. / Grigoropoulos, C. et al. | British Library Online Contents | 2008

Thermal stability of boron electrical activation in preamorphised ultra-shallow junctions

Cristiano, F. / Cherkashin, N. / Calvo, P. et al. | British Library Online Contents | 2004