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Ultra-shallow junctions produced by plasma doping and flash lamp annealing
Ultra-shallow junctions produced by plasma doping and flash lamp annealing
Ultra-shallow junctions produced by plasma doping and flash lamp annealing
Skorupa, W. (Autor:in) / Yankov, R. A. (Autor:in) / Anwand, W. (Autor:in) / Voelskow, M. (Autor:in) / Gebel, T. (Autor:in) / Downey, D. F. (Autor:in) / Arevalo, E. A. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 114/115 ; 358-361
01.01.2004
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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