Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
On the post-etching of diamond thin films in hydrogen-oxygen atmosphere
On the post-etching of diamond thin films in hydrogen-oxygen atmosphere
On the post-etching of diamond thin films in hydrogen-oxygen atmosphere
Xiling, P. (Autor:in) / Xiaolin, C. (Autor:in)
JOURNAL OF MATERIALS SCIENCE LETTERS ; 12 ; 687
01.01.1993
687 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Etching of CVD diamond films using oxygen ions in ECR plasma
British Library Online Contents | 2014
|Chemical etching of thin SiO~xC~yH~z films by post-deposition exposure to oxygen plasma
British Library Online Contents | 1999
|Pulsed Laser Deposition of TiO~2 Thin Films In Oxygen Atmosphere
British Library Conference Proceedings | 2000
|British Library Online Contents | 2012
|Etching of polycrystalline diamond films by electron beam assisted plasma
British Library Online Contents | 1996
|