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Epitaxial nucleation of polycrystalline silicon carbide during chemical vapor deposition
Epitaxial nucleation of polycrystalline silicon carbide during chemical vapor deposition
Epitaxial nucleation of polycrystalline silicon carbide during chemical vapor deposition
Sheldon, B. W. (Autor:in) / Besmann, T. M. (Autor:in) / More, K. L. (Autor:in) / Moss, T. S. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 8 ; 1086
01.01.1993
1086 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
620.11
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