Elimination of boundary effect in silicon electrochemical etching via mechanical stress

Ge, Daohan / Lu, Le / Huang, Xiukang et al. | British Library Online Contents | 2016

Using Grey relational analysis to determine wet chemical etching parameters in through-silicon-via etching application

Tang, C.-W. / Young, H.-T. | British Library Online Contents | 2013

Plasma Etching for the Application to Low-K Dielectrics Devices

Lee, J. W. / Kim, H. W. / Han, J. W. et al. | British Library Online Contents | 2007

Silicon etching in Cl2 environment

Knizikevicius, R. | British Library Online Contents | 2006

Application of KOH Anisotropic Etching in the Fabrication of MEMS Devices

Shang, Z.G. / Wen, Z.Y. / Li, D.L. et al. | British Library Online Contents | 2011