Application of ICP Deep Trenches Etching in the Fabrication of FBAR Devices

Shang, Z.G. / Li, D.L. / Wang, S.Q. et al. | British Library Online Contents | 2012

Strength Analysis of MEMS Micromirror Devices - Effects of Loading Mode and Etching Damage

Izumi, S. / Ping, C. W. / Yamaguchi, M. et al. | British Library Online Contents | 2005

High aspect ratio anisotropic silicon etching for x-ray phase contrast imaging grating fabrication

Finnegan, Patrick S. / Hollowell, Andrew E. / Arrington, Christian L. et al. | British Library Online Contents | 2019

Fabrication of Flat PZT Cantilevers through MEMS Technologies and Application to Optical MEMS

Kobayashi, T. / Tsaur, J. / Ichiki, M. et al. | British Library Online Contents | 2006

Self-organized technology of anisotropic etching of semiconductors for optoelectronics application

Dmitruk, N. L. / Borkovskaya, O. Y. / Mayeva, O. I. et al. | British Library Online Contents | 2002