Rapid thermal annealing of thin doped and undoped spin-on glass films

Ventura, L. / Slaoui, A. / Muller, J. C. et al. | British Library Online Contents | 1995

Annealing effects in undoped and phosphorus doped low temperature oxide layers

Samitier, J. / Moreno, J. A. / Garrido, B. et al. | British Library Online Contents | 1995

Evolution of boron-interstitial clusters in preamorphized silicon without the contribution of end-of-range defects

Aboy, M. / Pelaz, L. / Lopez, P. et al. | British Library Online Contents | 2008

Effects of crystalline regrowth on dopant profiles in preamorphized silicon

Hopstaken, M. J. P. / Tamminga, Y. / Verheijen, M. A. et al. | British Library Online Contents | 2004

Modeling of the transient enhanced diffusion of boron implanted into preamorphized silicon: the case of BF2+ implantation

Dusch, A. / Marcon, J. / Masmoudi, K. et al. | British Library Online Contents | 2001