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Deposition of hydrogenated amorphous silicon-carbon films by vacuum ultraviolet photo-CVD

Fujii, T. / Yoshimoto, M. / Fuyuki, T. / Matsunami, H.

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Deposition of hydrogenated amorphous silicon-carbon films by vacuum ultraviolet photo-CVD

Fujii, T. / Yoshimoto, M. / Fuyuki, T. / Matsunami, H.

Deposition of hydrogenated amorphous silicon-carbon films by vacuum ultraviolet photo-CVD

Fujii, T. / Yoshimoto, M. / Fuyuki, T. / Matsunami, H.

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Document information

Title:

Deposition of hydrogenated amorphous silicon-carbon films by vacuum ultraviolet photo-CVD

Contributors:

Fujii, T. (author) / Yoshimoto, M. (author) / Fuyuki, T. (author) / Matsunami, H. (author)

Published in:

APPLIED SURFACE SCIENCE ; 79/80 ; 316

Publication date:

1994-01-01

Size:

316 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 621.35

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