Laser etching of silicon by chlorine: effect of post-desorption collisions and chlorine in-diffusion on the laser desorption yield

Aliouchouche, A. / Boulmer, J. / Bourguignon, B. et al. | British Library Online Contents | 1993

Excimer laser induced chlorine etching of Si patterns for microelectronics

Baumgaertner, H. / Jiang, W. / Eisele, I. | British Library Online Contents | 1996

Excimer-laser-induced etching of silicon in chlorine atmosphere at a wavelength of 248 nm

Jiang, W. / Baumgaertner, H. / Eisele, I. | British Library Online Contents | 1995

Excimer Laser Etching

Boatner, L. / Longmire, H. / Rouleau, C. et al. | British Library Online Contents | 2008

Excimer laser etching of GaAs, Al~xGa~1~-~xAs and CuInSe~2 in chlorine atmosphere

Zimmer, K. / Dienelt, J. / Herfurth, F. et al. | British Library Online Contents | 1998