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Annealing behavior of phosphorus in native oxide films on heavily phosphorus doped silicon
Annealing behavior of phosphorus in native oxide films on heavily phosphorus doped silicon
Annealing behavior of phosphorus in native oxide films on heavily phosphorus doped silicon
Ying, W. B. (Autor:in) / Mizokawa, Y. (Autor:in) / Yu, Y. B. (Autor:in) / Kamiura, Y. (Autor:in) / Iida, M. (Autor:in) / Kawamoto, K. (Autor:in) / Feldman, L. C. / Nishizawa, J. / Van der Weg, W. F.
01.01.1996
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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