Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Chemical vapour deposition of silicon nitride in a microwave plasma assisted reactor
Chemical vapour deposition of silicon nitride in a microwave plasma assisted reactor
Chemical vapour deposition of silicon nitride in a microwave plasma assisted reactor
Monteiro, O. R. (Autor:in) / Wang, Z. (Autor:in) / Brown, I. G. (Autor:in)
JOURNAL OF MATERIALS SCIENCE ; 31 ; 6029-6033
01.01.1996
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Crystalline carbon nitride films prepared by microwave plasma chemical vapour deposition
British Library Online Contents | 2006
|British Library Online Contents | 2004
|Chemical Vapour Precipitation of Silicon Nitride Powders in a Laser Reactor
DOAJ | 2014
|British Library Online Contents | 1994
|Plasma-assisted chemical vapour deposition of tin/oxide coatings
British Library Online Contents | 1993
|