Chemical vapour deposition of silicon nitride in a microwave plasma assisted reactor: Fid-Bau Portal

Chemical vapour deposition of silicon nitride in a microwave plasma assisted reactor

Monteiro, O. R. / Wang, Z. / Brown, I. G.

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Chemical vapour deposition of silicon nitride in a microwave plasma assisted reactor

Monteiro, O. R. / Wang, Z. / Brown, I. G.

Chemical vapour deposition of silicon nitride in a microwave plasma assisted reactor

Monteiro, O. R. / Wang, Z. / Brown, I. G.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Chemical vapour deposition of silicon nitride in a microwave plasma assisted reactor

Contributors:

Monteiro, O. R. (author) / Wang, Z. (author) / Brown, I. G. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 31 ; 6029-6033

Publication date:

1996-01-01

Size:

5 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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