Reflection absorption infrared spectroscopy during atomic layer deposition of HfO2 films from tetrakis(ethylmethylamido)hafnium and water

Sperling, B. A. / Kimes, W. A. / Maslar, J. E. | British Library Online Contents | 2010

Atomic-layer chemical-vapor-deposition of silicon-nitride

Morishita, S. / Sugahara, S. / Matsumura, M. | British Library Online Contents | 1997

Atomic layer deposition in traveling-wave reactor: In situ diagnostics by optical reflection

Rosental, A. / Adamson, P. / Gerst, A. et al. | British Library Online Contents | 1997

Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces

Yokoyama, S. / Ikeda, N. / Kajikawa, K. et al. | British Library Online Contents | 1998

Monitoring of atomic layer deposition by incremental dielectric reflection

Rosental, A. / Adamson, P. / Gerst, A. et al. | British Library Online Contents | 1996