IR study of fundamental chemical reactions in atomic layer deposition of HfO2 with tetrakis(ethylmethylamino)hafnium (TEMAH), ozone, and water vapor

Hirose, F. / Kinoshita, Y. / Kanomata, K. et al. | British Library Online Contents | 2012

Characteristics of hafnium oxide grown on silicon by atomic-layer deposition using tetrakis(ethylmethylamino)hafnium and water vapor as precursors

Chiou, Y.-K. / Chang, C.-H. / Wu, T.-B. | British Library Online Contents | 2007

Hafnium silicon oxide films prepared by atomic layer deposition

Kukli, K. / Ritala, M. / Leskela, M. et al. | British Library Online Contents | 2004

Silicon surface passivation using thin HfO2 films by atomic layer deposition

Gope, J. / Batra, N. / Panigrahi, J. et al. | British Library Online Contents | 2015

Atomic layer deposition of hafnium and zirconium silicate thin films

Vainonen-Ahlgren, E. / Tois, E. / Ahlgren, T. et al. | British Library Online Contents | 2003