Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Preparation of silicon oxide films by ultraviolet-assisted rf plasma-enhanced chemical vapour deposition
Preparation of silicon oxide films by ultraviolet-assisted rf plasma-enhanced chemical vapour deposition
Preparation of silicon oxide films by ultraviolet-assisted rf plasma-enhanced chemical vapour deposition
Hozumi, A. (Autor:in) / Sugimoto, N. (Autor:in) / Sekoguchi, H. (Autor:in) / Takai, O. (Autor:in)
JOURNAL OF MATERIALS SCIENCE LETTERS ; 16 ; 860-862
01.01.1997
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Plasma-assisted chemical vapour deposition of tin/oxide coatings
British Library Online Contents | 1993
|AIN thin films by plasma-enhanced chemical vapour deposition
British Library Online Contents | 1992
|British Library Online Contents | 1993
|Deposition of diamond-like carbon films by plasma enhanced chemical vapour deposition
British Library Online Contents | 1997
|Chemical vapour deposition of silicon nitride in a microwave plasma assisted reactor
British Library Online Contents | 1996
|