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Preparation of silicon oxide films by ultraviolet-assisted rf plasma-enhanced chemical vapour deposition

Hozumi, A. / Sugimoto, N. / Sekoguchi, H. / Takai, O.

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Preparation of silicon oxide films by ultraviolet-assisted rf plasma-enhanced chemical vapour deposition

Hozumi, A. / Sugimoto, N. / Sekoguchi, H. / Takai, O.

Preparation of silicon oxide films by ultraviolet-assisted rf plasma-enhanced chemical vapour deposition

Hozumi, A. / Sugimoto, N. / Sekoguchi, H. / Takai, O.

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Document information

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Document information

Title:

Preparation of silicon oxide films by ultraviolet-assisted rf plasma-enhanced chemical vapour deposition

Contributors:

Hozumi, A. (author) / Sugimoto, N. (author) / Sekoguchi, H. (author) / Takai, O. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE LETTERS ; 16 ; 860-862

Publication date:

1997-01-01

Size:

3 pages

ISSN:

0261-8028

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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