Low Dielectric Constant Materials for ULSI Interconnects

Morgen, M. / Ryan, E. T. / Zhao, J.-H. et al. | British Library Online Contents | 2000

Fluorinated Amorphous Carbon as a Low-Dielectric-Constant Interlayer Dielectric

Endo, K. | British Library Online Contents | 1997

Low dielectric constant materials and methods for interlayer dielectric films in ultralarge-scale integrated circuit multilevel interconnections

Homma, T. | British Library Online Contents | 1998

Chemical Mechanical Polishing of Silica Dielectric in ULSI Manufacturing

Tan, B.-m. / Liu, Y.-l. / Lian, J. | British Library Online Contents | 2001

Low Dielectric Constant Materials for IC Applications

British Library Online Contents | 2003