A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
Low-Dielectric-Constant Materials for ULSI Interlayer-Dielectric Applications
Low-Dielectric-Constant Materials for ULSI Interlayer-Dielectric Applications
Low-Dielectric-Constant Materials for ULSI Interlayer-Dielectric Applications
Lee, W. W. (author) / Ho, P. S. (author)
MRS BULLETIN- MATERIALS RESEARCH SOCIETY ; 22 ; 19-27
1997-01-01
9 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Low Dielectric Constant Materials for ULSI Interconnects
| British Library Online Contents | 2000
Fluorinated Amorphous Carbon as a Low-Dielectric-Constant Interlayer Dielectric
| British Library Online Contents | 1997
| British Library Online Contents | 1998
Chemical Mechanical Polishing of Silica Dielectric in ULSI Manufacturing
| British Library Online Contents | 2001
Low Dielectric Constant Materials for IC Applications
British Library Online Contents | 2003