In situ FT-IR reflective absorption spectroscopy for characterization of SiO~2 thin films deposited using sputtering-type electron cyclotron resonance microwave plasma: Fid-Bau Portal

In situ FT-IR reflective absorption spectroscopy for characterization of SiO~2 thin films deposited using sputtering-type electron cyclotron resonance microwave plasma

Furukawa, K. / Liu, Y. / Gao, D. / Nakashima, H. / Uchino, K. / Muraoka, K.

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In situ FT-IR reflective absorption spectroscopy for characterization of SiO~2 thin films deposited using sputtering-type electron cyclotron resonance microwave plasma

Furukawa, K. / Liu, Y. / Gao, D. / Nakashima, H. / Uchino, K. / Muraoka, K.

In situ FT-IR reflective absorption spectroscopy for characterization of SiO~2 thin films deposited using sputtering-type electron cyclotron resonance microwave plasma

Furukawa, K. / Liu, Y. / Gao, D. / Nakashima, H. / Uchino, K. / Muraoka, K.

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Titel:

In situ FT-IR reflective absorption spectroscopy for characterization of SiO~2 thin films deposited using sputtering-type electron cyclotron resonance microwave plasma

Beteiligte:

Furukawa, K. (Autor:in) / Liu, Y. (Autor:in) / Gao, D. (Autor:in) / Nakashima, H. (Autor:in) / Uchino, K. (Autor:in) / Muraoka, K. (Autor:in)

Erschienen in:

APPLIED SURFACE SCIENCE ; 121/122 ; 228-232

Erscheinungsdatum:

01.01.1997

Format / Umfang:

5 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

Liu, Y. C. / Furukawa, K. / Gao, D. W. et al. | British Library Online Contents | 1997

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