Residual Stress in Thin Films of RF-Sputtered Aluminum by X-Ray Multiaxial Stress Measurement: Fid-Bau Portal

Residual Stress in Thin Films of RF-Sputtered Aluminum by X-Ray Multiaxial Stress Measurement

Ejiri, S. / Lin, Z. / Sasaki, T. / Hirose, Y.

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Residual Stress in Thin Films of RF-Sputtered Aluminum by X-Ray Multiaxial Stress Measurement

Ejiri, S. / Lin, Z. / Sasaki, T. / Hirose, Y.

Residual Stress in Thin Films of RF-Sputtered Aluminum by X-Ray Multiaxial Stress Measurement

Ejiri, S. / Lin, Z. / Sasaki, T. / Hirose, Y.

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Check availability in my library

Order at Subito €

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Document information

Title:

Residual Stress in Thin Films of RF-Sputtered Aluminum by X-Ray Multiaxial Stress Measurement

Contributors:

Ejiri, S. (author) / Lin, Z. (author) / Sasaki, T. (author) / Hirose, Y. (author)

Published in:

ADVANCES IN X RAY ANALYSIS ; 433-438

Publication date:

1997-01-01

Size:

6 pages

ISSN:

0376-0308

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 539.7222

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