Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Spectroellipsometric Method for Process Monitoring of Semiconductor Thin Films and Interfaces
Spectroellipsometric Method for Process Monitoring of Semiconductor Thin Films and Interfaces
Spectroellipsometric Method for Process Monitoring of Semiconductor Thin Films and Interfaces
Brenot, R. (Autor:in) / Kildemo, M. (Autor:in) / Drevillon, B. (Autor:in)
MATERIALS SCIENCE FORUM ; 287/288 ; 151-158
01.01.1998
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Spectroellipsometric characterisation of thin epitaxial Si~1~-~xGe~x layers
British Library Online Contents | 1995
|Spectroellipsometric characterization of nanocrystalline diamond layers
British Library Online Contents | 2013
|Spectroellipsometric characterization of Au-Y~2O~3-stabilized ZrO~2 nanocomposite films
British Library Online Contents | 2005
|Process monitoring of semiconductor thin films and interfaces by spectroellipsometry
British Library Online Contents | 2000
|Spectroellipsometric characterization of materials for multilayer coatings
British Library Online Contents | 2001
|