Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
On chemo-mechanical polishing (CMP) of silicon nitride (Si~3N~4) workmaterial with various abrasives
On chemo-mechanical polishing (CMP) of silicon nitride (Si~3N~4) workmaterial with various abrasives
On chemo-mechanical polishing (CMP) of silicon nitride (Si~3N~4) workmaterial with various abrasives
Jiang, M. (Autor:in) / Wood, N. O. (Autor:in) / Komanduri, R. (Autor:in)
WEAR -LAUSANNE- ; 220 ; 59-71
01.01.1998
13 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11292
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