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    On chemo-mechanical polishing (CMP) of silicon nitride (Si~3N~4) workmaterial with various abrasives

    New search for: Jiang, M.
    New search for: Wood, N. O.
    New search for: Komanduri, R.

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    On chemo-mechanical polishing (CMP) of silicon nitride (Si~3N~4) workmaterial with various abrasives

    New search for: Jiang, M.
    New search for: Wood, N. O.
    New search for: Komanduri, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    On chemo-mechanical polishing (CMP) of silicon nitride (Si~3N~4) workmaterial with various abrasives

    New search for: Jiang, M.
    New search for: Wood, N. O.
    New search for: Komanduri, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    On chemo-mechanical polishing (CMP) of silicon nitride (Si~3N~4) workmaterial with various abrasives

    Contributors:

    Jiang, M. (author) / Wood, N. O. (author) / Komanduri, R. (author)

    Published in:

    WEAR -LAUSANNE- ; 220 ; 59-71

    Publication date:

    1998-01-01

    Size:

    13 pages

    ISSN:

    0043-1648

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11292

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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