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Polycrystalline silicon precipitates on SiO~2 using an argon excimer laser
Polycrystalline silicon precipitates on SiO~2 using an argon excimer laser
Polycrystalline silicon precipitates on SiO~2 using an argon excimer laser
Ohmukai, M. (Autor:in) / Takigawa, Y. (Autor:in) / Kurosawa, K. (Autor:in)
APPLIED SURFACE SCIENCE ; 137 ; 78-82
01.01.1999
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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