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Polycrystalline silicon precipitates on SiO~2 using an argon excimer laser

Ohmukai, M. / Takigawa, Y. / Kurosawa, K.

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Polycrystalline silicon precipitates on SiO~2 using an argon excimer laser

Ohmukai, M. / Takigawa, Y. / Kurosawa, K.

Polycrystalline silicon precipitates on SiO~2 using an argon excimer laser

Ohmukai, M. / Takigawa, Y. / Kurosawa, K.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Polycrystalline silicon precipitates on SiO~2 using an argon excimer laser

Contributors:

Ohmukai, M. (author) / Takigawa, Y. (author) / Kurosawa, K. (author)

Published in:

APPLIED SURFACE SCIENCE ; 137 ; 78-82

Publication date:

1999-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

Elsner, C. / Lenk, M. / Prager, L. et al. | British Library Online Contents | 2006

Characterization of Polycrystalline Si Films Produced by ArF Excimer Laser Irradiation

Chen, T. T. / Chang, C. Y. | British Library Online Contents | 2006

Optical properties of excimer laser annealed polycrystalline Si by spectroscopic ellipsometry

Yu, G. / Soga, T. / Shao, C. L. et al. | British Library Online Contents | 1997

Metal-Induced Crystallization of Polycrystalline Silicon by In-Situ Excimer Laser Annealing During Low-Pressure CVD Growth

Loreti, S. / Santoni, A. / Frycek, R. et al. | British Library Online Contents | 2004

X-ray emission spectroscopic studies of silicon precipitation in surface layer of SiO~2 induced by argon excimer laser irradiation

Kurosawa, K. / Herman, P. R. / Kurmaev, E. Z. et al. | British Library Online Contents | 1998