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    Rutherford backscattering/channeling study of the implanted MeV Au^+ in silicon

    New search for: Wang, K.-M.
    New search for: Meng, M.-Q.
    New search for: Lu, F.
    New search for: Shi, B.-R.
    New search for: Wang, F.-X.
    New search for: Li, W.
    New search for: Shen, D.-Y.
    New search for: Wang, X.-M.

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    Rutherford backscattering/channeling study of the implanted MeV Au^+ in silicon

    New search for: Wang, K.-M.
    New search for: Meng, M.-Q.
    New search for: Lu, F.
    New search for: Shi, B.-R.
    New search for: Wang, F.-X.
    New search for: Li, W.
    New search for: Shen, D.-Y.
    New search for: Wang, X.-M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Rutherford backscattering/channeling study of the implanted MeV Au^+ in silicon

    New search for: Wang, K.-M.
    New search for: Meng, M.-Q.
    New search for: Lu, F.
    New search for: Shi, B.-R.
    New search for: Wang, F.-X.
    New search for: Li, W.
    New search for: Shen, D.-Y.
    New search for: Wang, X.-M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Rutherford backscattering/channeling study of the implanted MeV Au^+ in silicon

    Contributors:

    Wang, K.-M. (author) / Meng, M.-Q. (author) / Lu, F. (author) / Shi, B.-R. (author) / Wang, F.-X. (author) / Li, W. (author) / Shen, D.-Y. (author) / Wang, X.-M. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 57 ; 92-96

    Publication date:

    1999-01-01

    Size:

    5 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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