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Heavily boron-doped Czochralski (CZ) silicon crystal growth: segregation and constitutional supercooling
Heavily boron-doped Czochralski (CZ) silicon crystal growth: segregation and constitutional supercooling
Heavily boron-doped Czochralski (CZ) silicon crystal growth: segregation and constitutional supercooling
Taishi, T. (Autor:in) / Huang, X. (Autor:in) / Kubota, M. (Autor:in) / Kajigaya, T. (Autor:in) / Fukami, T. (Autor:in) / Hoshikawa, K. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 72 ; 169 - 172
01.01.2000
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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