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Excimer Laser Annealing of Ion-Implanted 6H-Silicon Carbide
Excimer Laser Annealing of Ion-Implanted 6H-Silicon Carbide
Excimer Laser Annealing of Ion-Implanted 6H-Silicon Carbide
Hishida, Y. (Autor:in) / Watanabe, M. (Autor:in) / Nakashima, K. (Autor:in) / Eryu, O. (Autor:in)
MATERIALS SCIENCE FORUM ; 338/342 ; 873-876
01.01.2000
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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